Tuesday, April 03, 2012: 12:08:39 PM

Honeywell Opens New Technology Centre in India

Honeywell has opened a new technology centre in India, further expanding its technology development capabilities in key areas including refining, petrochemical, low-global-warming and nylon technologies and applications.

The facility in Gurgaon, India features pilot plants for developing and demonstrating refining and petrochemical process technology by UOP, part of Honeywell’s Performance Materials and Technologies (PMT) strategic business group. The centre will also perform other product and application development for PMT, including fluorine and nylon technologies.

‘This new facility will allow Honeywell to put its vast resources to work in collaboration with some of the brightest engineering minds in India’, said Rajeev Gautam, President and CEO, Honeywell´s UOP, who officially opened the centre at a ceremony attended by Shri Jaipal Reddy, India’s Minister of Petroleum & Natural Gas, and other dignitaries. ‘It brings the development of key technologies closer to our customers in the region and complements our other technology centres around the world’.

The Honeywell India Technology Centre will primarily support Honeywell UOP’s work in developing and licensing process technologies used in refining and the production of petrochemicals and renewable fuels. UOP is a recognised leader in refining, petrochemical and biofuel process technology.

Additionally, the facility will support PMT’s efforts to develop new low-global-warming refrigerants, blowing agents and other materials. Engineers at the technology centre will also conduct research and customer-specific engineering work in caprolactam, a key material used in nylon production and nylon resin.

‘This centre adds to India’s growing strength as a global knowledge hub, allowing some of the best engineering minds to produce breakthrough technologies to be used in India and beyond’, says Mark Turowicz, Managing Director, Honeywell Performance Materials and Technologies India.


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